Účet Kontakt
Váš košík
Doručenie cez DPD a FedEx
Pomoc? Opýtajte sa AI

K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm

K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm
K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm
K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm
K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm
K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm
K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm
K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm
K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm
35,46 €
The K&F Concept Nano-X MRC UV Filter is a high-performance lens accessory designed to protect your lens while enhancing image quality. Featuring advanced Nano-X Multi-Resistant Coating (MRC) with 28 layers, it achieves over 99.6% light transmittance and less than 0.3% reflection, ensuring ultra-low ... Čítať viac
Sklad 10 Kód 3031992 Značka KF Model 5904647821934 Záruka 2 roky

Doprava a vrátenie tovaru

Predpokladané doručenie utorok, novembra 3
O stave zásielky Vás budeme priebežne informovať prostredníctvom nášho podrobného systému sledovania zásielok
Možnosti platby
Platobná kartaVisaMastercardPayPalApple PayGoogle PayBankový prevod

The K&F Concept Nano-X MRC UV Filter is a high-performance lens accessory designed to protect your lens while enhancing image quality. Featuring advanced Nano-X Multi-Resistant Coating (MRC) with 28 layers, it achieves over 99.6% light transmittance and less than 0.3% reflection, ensuring ultra-low reflection and superior clarity. The filter is crafted from Japanese AGC optical glass and an aviation aluminum alloy frame, offering durability and a slim profile of 3.3 mm. It is water-resistant, oil-resistant, scratch-resistant, and anti-static, making it ideal for outdoor and studio photography. The double-threaded design allows for stacking additional filters or lens caps.

Advantages

Ultra-low reflection reduces glare and flare, improving contrast and color accuracy. The multi-resistant coating protects against water, oil, scratches, and static, ensuring easy cleaning and long-lasting performance. The ultra-slim frame prevents vignetting on wide-angle lenses.

Suitable for

  • Photographers seeking lens protection without compromising image quality
  • Outdoor and landscape photography to reduce atmospheric haze
  • Studio work requiring high light transmission and minimal reflections

Key specifications

  • Filter Type: UV Filter
  • Filter Diameter: 55 mm
  • Coating: Nano-X Multi-Resistant Coating (MRC), 28 layers double-sided
  • Light Transmittance: >99.6%
  • Reflection Rate: <0.3%
  • Glass Material: Japanese AGC Optical Glass
  • Frame Material: Aviation Aluminum Alloy
  • Frame Thickness: 3.3 mm
  • Thread Type: Double-threaded (front and rear)
  • Water, Oil, Scratch, and Static Resistant

Recommendations

For optimal performance, pair this UV filter with a lens hood to minimize stray light. Clean with a microfiber cloth to maintain coating integrity. Ideal for both amateur and professional photographers.

Parametre
EAN
5904647821934
Kategória
Camera Filters
Model
Nano-X MRC UV Filter 55mm
MPN
KF01.2462
Typ produktu
UV Filter
Veľkosť
55 mm
Značka
K&F Concept
Vývoj ceny za posledných 6 mesiacov
K&F Concept Nano-X MRC UV filter ultra nízky odraz 55mm
Aktuálna
35,46 €
Najnižšia
34,58 €
Najvyššia
37,52 €
Zmena za 24 h
+0,86 €   +2%
Týždeň
+0,51 €   +1%
Mesiac
-0,21 €   -1%

Populárne produkty v tejto kategórii

Predajca: UAB KUR LT · Laisvės pr. 125A, LT-06118 Vilnius, Litva · IČO 303192950 · IČ DPH LT100008198612 · Odoslanie z EÚ (Litva)
Dobrý deň, som AI asistent DistriNode. Pomôžem Vám nájsť produkty, porovnať možnosti, vytvoriť cenovú ponuku v PDF alebo otvoriť požiadavku na podporu.